Skip to content
RDL
Network
Ekosistem
Uygulama değiştir
EN
Hakkımızda
SSS
Giriş yap
Başla
High-voltage glow discharge plasma immersion ion implantation assisted by magnetic field — Xiubo Tian (2009) | RDL Network
Back
Cite
Save
Save for later
Share
Home
Publications
High-voltage glow discharge plasma immersion ion implantation assisted by magnetic field
Shared by
Paul Kim Ho Chu
High-voltage glow discharge plasma immersion ion implantation assisted by magnetic field
Article
2009
en
Authors
+3 more
XT
Xiubo Tian
CG
Chunzhi Gong
LL
Lei Liu
Discussion
(0)
Sign in
to like and join the discussion.
No comments yet. Be the first to comment.
Related publications
Article
2003
Effect of magnetic field on high-voltage glow discharge during plasma implantation
X.B. Tian
,
Sang-Hyun Yang
,
R.K.Y. Fu
,
Paul Kim Ho Chu
Article
2004
Evaporation–glow discharge hybrid source for plasma immersion ion implantation
L.H Li
,
Ricky K.Y. Fu
,
R.W.Y. Poon
,
Sunny Kwok
,
Paul Kim Ho Chu
,
Yulun Wu
,
Y.H Zhang
,
Xin Cai
,
Q.L Chen
,
Ming Xu
Article
2003
Hybrid evaporation: Glow discharge source for plasma immersion ion implantation
L. H. Li
,
R.W.Y. Poon
,
Sunny Kwok
,
Paul Kim Ho Chu
,
Yulun Wu
,
Y. H. Zhang
Article
2000
Investigation of High Voltage Low Gas Pressure Glow Discharge in Direct-Current (DC) Plasma Immersion Ion Implantation
Xuchu Zeng
,
Dixon T. K. Kwok
,
Chung Chan
,
Paul Kim Ho Chu
Article
2008
Investigation of plasma distribution in electron-focused electric field enhanced glow discharge plasma immersion ion implantation
Qiu Yuan Lu
,
Liu He Li
,
Ricky K.Y. Fu
,
Paul Kim Ho Chu
Discussion(0)
No comments yet. Be the first to comment.