Effect of magnetic field on high-voltage glow discharge during plasma implantation
Article 2003 en
Authors
XT
X.B. Tian
SY
Sang-Hyun Yang
RF
R.K.Y. Fu
Abstract
1 min read
Summary form only given, as follows. In this paper, we report our findings on the effects on the magnetic field on the high-voltage glow discharge process.
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