Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

In order to achieve stable operation for elements with a low melting point or high vapor pressure, a quasiequilibrium evaporation–glow discharge evaporation source has been designed and investigated for plasma immersion ion implantation. The important relationship between the pressure in the evaporation chamber and the implantation chamber is studied for optimal performance. Our experimental results show that the hybrid evaporation–glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.