Transformation of Enhanced Glow Discharge Dynamics in Nitrogen Plasma Immersion Ion Implantation

In nitrogen enhanced glow discharge plasma immersion ion implantation, the implantation current increases sharply with the gas pressure when a threshold pressure is exceeded, indicating that the glow discharge dynamics changes with increasing diatomic gas flow rate. The voltage drop rendered by the anode glow produces noticeable N <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> dissociation and electron-atom ionization in the positive column which expands to the cathode. As a result, charged particles reach the cathode more easily, and the larger plasma density and N <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> /N <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> ratio in the positive column lead to the higher current. Our results clarify the implantation current characteristics and expedite adoption of this alternative plasma immersion technology.