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Oxygen segregation and Ge diffusion in annealed oxygen ion-implanted relaxed SiGe/Si heterostructures — Zhenghua An (2004) | RDL Network
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Oxygen segregation and Ge diffusion in annealed oxygen ion-implanted relaxed SiGe/Si heterostructures
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Paul Kim Ho Chu
Oxygen segregation and Ge diffusion in annealed oxygen ion-implanted relaxed SiGe/Si heterostructures
Article
2004
en
Authors
+2 more
ZA
Zhenghua An
MZ
Miao Zhang
RF
Ricky K.Y. Fu
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