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Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow discharge — Zhenghua An (2003) | RDL Network
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Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow discharge
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Paul Kim Ho Chu
Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow discharge
Article
2003
en
Authors
+3 more
ZA
Zhenghua An
RF
Ricky K.Y. Fu
PC
Peng Chen
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