Fabrication of ring structures by anodization lithography on self-assembled OTS monolayers

A new and rational fabrication concept to obtain ring structures with nanometer dimensions is presented that utilizes a combination of anodization and electrochemical oxidation lithography on a self-assembled monolayer of n-octadecyltrichlorosilane performed with an electrically biased scanning force microscopy tip. During the oxidation process two different chemical areas are created; a silicon oxide core which is surrounded by a chemically active, acid functionalized rim feature. The oxidation conditions, as well as the scaling options of this lithographic process have been investigated and revealed good controllability of the ring dimensions. A straightforward electroless metal deposition process was used to convert the ring structures into metal features.