Abstract Transparent conductive oxides like indium tin oxide (ITO) play a pivotal role in a wide range of innovative applications, such as new generations of solar cells. In many of these applications the tailoring of surface properties on the nanometer scale represents a highly desirable target. The local oxidation of self‐assembled monolayers (SAMs) using a scanning probe is a promising technique to achieve surface modifications on the nanometer scale. So far, electro‐oxidative lithography of SAMs has been reported mainly on Si wafers while there are no previous reports on transparent oxides. Here, we report the oxidative lithography of n ‐octadecyltrichlorosilane (OTS) SAM deposited onto an ITO layer. A local overoxidation of the substrate is observed while the simultaneously occurring monolayer oxidation is indirectly confirmed by the site‐selective deposition of silver nanoparticles onto electro‐oxidized areas. The process of lithography is compared to that on OTS‐Si substrates and its mechanism is systematically investigated by means of scanning Kelvin probe microscopy (SKPM).
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