Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique — Fatih Şenaslan (2021) | RDL Network
Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique
Asim Jilani, Mohd Hafiz Dzarfan Othman, Mohammad Omaish Ansari, Rajeev Kumar, Imran Ullah Khan, Mohamed Sh. Abdel-wahab, Ahmed Alshahrie, M.A. Barakat, Tonni Agustiono Kurniawan
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