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Structural and optoelectrical properties of Nb-TiO2 films fabricated by low-energy magnetron sputtering and post-annealing — Cuiqing Jiang (2018) | RDL Network
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Structural and optoelectrical properties of Nb-TiO2 films fabricated by low-energy magnetron sputtering and post-annealing
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Paul Kim Ho Chu
Structural and optoelectrical properties of Nb-TiO2 films fabricated by low-energy magnetron sputtering and post-annealing
Article
2018
en
Authors
+6 more
CJ
Cuiqing Jiang
ZW
Zhongzhen Wu
SX
Shu Xiao
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