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Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering — Tao Zhou (2009) | RDL Network
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Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering
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Paul Kim Ho Chu
Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering
Article
2009
en
Authors
+1 more
TZ
Tao Zhou
PN
Pulin Nie
XC
Xun Cai
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