An electron diffraction determination of the molecular structure of trifluorosilyl isocyanate

The molecular structure of F3SiNCO has been determined in the vapour phase by the sector microphotometer method of electron diffraction. The data are consistent with an Si-N-C angle of 160.7±1.2°, and Si-F and Si-N bond lengths of 1.553±0.004 and 1.648±0.010 Å respectively; the N-C and C-O bond lengths are strongly correlated with each other. The problems of interpretation of the electron diffraction structure are discussed in the light of a possible low Si-N-C deformation frequency.