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Porous-type anodic oxide Al films were investigated by means of two non-destructive, in situ applicable analysis techniques, electrochemical impedance spectroscopy (EIS) and spectroscopic ellipsometry (SE). The porous part of the porous film cannot be characterized with EIS measurements in aqueous solutions due to short-circuiting of the porous oxide by the electrolyte in the pores. By introducing an optical model which matches previous TEM investigations it is shown that SE characterizes the porous film morphology, including the porous part and the barrier part thicknesses, porosity and film-substrate interface roughness throughout the entire growth process. SE also allows us to determine the change in growth rate for films formed at increasing current density.
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Surface treatments of metals, leading to the deposition of thin films, are generally performed in order to create or change certain surface properties such as corrosion resistance or adhesion. For the past few years, the use of organosilanes for aluminium surface treatments are more and more considered as they provide both corrosion protection and adhesion properties. It has been previously shown that the silane bath concentration strongly influences the thickness of the silane films deposited on aluminium substrates. A linear increase of the layer thickness with the silane bath concentration has been underlined. In this paper, the chemistry of the deposited silane films has been studied as a function of the silane bath concentration. For this, Infra red spectroscopic ellipsometry (IRSE) has been used. It is a method similar to reflection absorption infra red spectroscopy (RAIRS), which is a non-destructive infra red reflection technique, allowing chemical characterisation of thin films on metals. It will be shown that differences in the positions and strength of absorption bands are visible when the silane concentration of the solution is varied. Such changes can result in a difference in the film chemistry or in the film thickness. Since IRSE offers chemical information along with the thickness information, modifications occurring in an IRSE spectrum can be understood more easily. It will be demonstrated that the use of an optical model, describing the absorption bands and thickness of the films, permits the determination of the chemistry and the thickness of the silane films.
No abstract is provided for this article.
In this paper the interaction between organic molecules and aluminium oxide is considered. The overall study concentrates on the chemical interface which is created between an organic layer and aluminium oxide. The knowledge of the composition and structure of hydrated films on aluminium is important for the bonding between aluminium and polymers. Native surface layers on aluminium consist of an anhydrous inner layer of amorphous Al2O3 and an hydrated outer layer, where the outer layer determines the adhesion properties. The pseudoboehmite oxyhydroxide surface can be seen as a model for the chemistry found at the surface of the air-formed film after ambient exposure of the aluminium metal. XPS was used to determine the hydroxyl activity on prepared Al substrates. The studied surface treatments were vacuum evaporated, thermally oxidized, alkaline etched, acid etched and boiled in water. As roughness is important electropolished aluminium samples were used. FESEM, FEAUGER, AFM and XPS were used to see the distribution of the organic molecule over the surface. FTIR-RAIRS was used to study the nature of the interfacial bonding. In this contribution some data about phosphonic acids and carboxylic acids are reported. The bonding of the carboxylic organic molecules was correlated with the presence of OH activity on the Al surface.
In this chapter, first, a survey on the early stages of electrochemical nucleation and growth is provided with special emphasis on recent discoveries which provide new insights on electrochemical nanoparticle formation. Then, a comprehensive review of nanoparticle...
The virtual interface width in AES sputter depth profiles of amorphous anodic oxide coatings on aluminium is investigated. Even when the physical film–substrate interface is relatively sharp, considerable deterioration of the depth resolution may be caused by sputter‐induced roughness if sputtering conditions or the sample quality are not chosen properly. The effects of the oxide film thickness, choice of sputter angle and initial substrate roughness on the appearance of the interface width are investigated. A systematic study of the influence of Zalar rotation on the depth resolution is presented. It is concluded that long sputter times, due to film thickness or grazing sputter angles, and initial surface roughness cause a deterioration of the depth resolution. Zalar rotation generally improves the depth resolution for amorphous films, and is particularly indicated for the analysis of very rough samples. The sputter rate of amorphous films however, is insensitive to the use of Zalar rotation.