Topological van der Waals Contact for Two-Dimensional Semiconductors
ACS Nano
Article 2024 English
Authors
SG
Soheil Ghods
HL
Hyunjin Lee
JC
Jun‐Hui Choi
Abstract
1 min read
The relentless miniaturization inherent in complementary metal-oxide semiconductor technology has created challenges at the interface of two-dimensional (2D) materials and metal electrodes. These challenges, predominantly stemming from metal-induced gap states (MIGS) and Schottky barrier heights (SBHs), critically impede device performance. This work introduces an innovative implementation of damage-free Sb
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