All van der Waals Semiconducting PtSe<sub>2</sub> Field Effect Transistors with Low Contact Resistance Graphite Electrodes — Muhammad Awais Aslam (2024) | RDL Network
All van der Waals Semiconducting PtSe<sub>2</sub> Field Effect Transistors with Low Contact Resistance Graphite Electrodes
Article 2024 en
Authors
MA
Muhammad Awais Aslam
SL
Simon Leitner
ST
Shubham Tyagi
Abstract
1 min read
Contact resistance is a multifaceted challenge faced by the 2D materials community. Large Schottky barrier heights and gap-state pinning are active obstacles that require an integrated approach to achieve the development of high-performance electronic devices based on 2D materials. In this work, we present semiconducting PtSe<sub>2</sub> field effect transistors with all-van-der-Waals electrode and dielectric interfaces. We use graphite contacts, which enable high <i>I</i><sub>ON</sub>/<i>I</i><sub>OFF</sub> ratios up to 10<sup>9</sup> with currents above 100 μA μm<sup>-1</sup> and mobilities of 50 cm<sup>2</sup> V<sup>-1</sup> s<sup>-1</sup> at room temperature and over 400 cm<sup>2</sup> V<sup>-1</sup> s<sup>-1</sup> at 10 K. The devices exhibit high stability with a maximum hysteresis width below 36 mV nm<sup>-1</sup>. The contact resistance at the graphite-PtSe<sub>2</sub> interface is found to be below 700 Ω μm. Our results present PtSe<sub>2</sub> as a promising candidate for the realization of high-performance 2D circuits built solely with 2D materials.
Jingxu Xie, Zuocheng Zhang, Haodong Zhang, Vikram Nagarajan, Wenyu Zhao, Ha-Leem Kim, Collin Sanborn, Ruishi Qi, Su-Di Chen, Salman Kahn, Kenji Watanabe, Takashi Taniguchi, Alex Zettl, Michael F. Crommie, James G. Analytis, Feng Wang
Dmitry Lebedev, J. Tyler Gish, Ethan S. Garvey, S. Carin Gavin, Thomas W. Song, Manuel R. Tiscareno, Kenji Watanabe, Takashi Taniguchi, Jan Konečný, Zdeněk Sofer, Nathaniel P. Stern, Vinod K. Sangwan, Mark C. Hersam
Discussion(0)
No comments yet. Be the first to comment.