Plasma immersion ion implantation ( PIII) has proven to be a low cost and high efficient surface modification technique to treat complex shaped objects. The target is immersed in a plasma ,and t he ions ,extracted from t he plasma directly ,are accelecrated and t hen implanted into t he surface by applied negative high2voltage pulses to t he target . In order to describe t he implantation dynam2 ics ,t he plasma sheat h has been studied by t he particle2in2cell ( PIC) simulation t hrough t he solution of t he Poisson' s equation ,t he Bolz2 mann' s approximation for t he electrons and t he Newton' s equation of t he movement of ions in t he grid. The temporal evolution in matrix sheat h including t he potential ,ion densit y ,ion velocity ,kinetic energy and ion current density is paid more attention.
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