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Spatial potential distribution around trench target during plasma immersion ion implantation — Xiubo Tian (2009) | RDL Network
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Spatial potential distribution around trench target during plasma immersion ion implantation
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Paul Kim Ho Chu
Spatial potential distribution around trench target during plasma immersion ion implantation
Article
2009
en
Authors
+2 more
XT
Xiubo Tian
CW
Chunbei Wei
SY
Shiqin Yang
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