Rapid Prototyping of 2D Structures with Feature Sizes Larger than 8 μm

This paper extends rapid prototyping for several types of lithography to the 8−25-μm size range, using transparency photomasks prepared by photoplotting. It discusses the technical improvement in photomask quality achieved by photoplotting, compared to the currently used image setting, and demonstrates differences in the resolution that can be obtained with photomasks with features in the 8−100-μm size range. These high-resolution photomasks were used to microfabricate microelectrodes, microlenses, and stamps for microcontact printing, following methods described previously.