Preparation of SixCyHz films from methylsilane by plasma-enhanced chemical vapor deposition

M.P. Delplancke; James M. Powers; G.J. Vandentop; Gabor Somorjai

doi:10.1016/0040-6090(91)90100-c

Related publications

Article1991

Preparation of SI{sub x}C{sub y}H{sub z} Films from Methylsilane by Plasma Enhanced Chemical Vapor Deposition

M.P. Delplancke, James M. Powers, G.J. Vandentop, Gabor Somorjai

Article1991

Characterization of a:SiC:H thin films deposited by plasma enhanced chemical vapor deposition

Marie‐Paule Delplancke, James M. Powers, Gabor Somorjai

Chapter in a book2012

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Patrick M. Winter, Gregory M. Lanza, Samuel A. Wickline, Marc Madou, Chunlei Wang, Parag B. Deotare, Marko Lončar, Yoke Khin Yap, Jérôme Rose, Mélanie Auffan, Olivier Proux, Vincent Nivière, Jean‐Yves Bottero, Zhong Lin Wang, Ying Liu, Ronald G. Polcawich, J. S. Pulskamp, R. M. Proie, Woo-Tae Park, Sergei V. Kalinin, Brian J. Rodriguez, Andréi L. Kholkin, Gang Logan Liu, Jao van de Lagemaat, Lorenzo Valdevit,

Article2005

In vitro investigation of hemocompatibility of hydrophilic SiNx:H films fabricated by plasma-enhanced chemical vapor deposition

Guojiang Wan, Ping Yang, Xue Jie Shi, Man Wong, Hongyi Zhou, Nan Huang, Paul Kim Ho Chu

Article2003

Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4.

Raymond N. Vrtis, Mark L. O’Neill, Jean Louis Vincent, A.S. Lukas, Brian K. Peterson, Mark D. Bitner, Eugene J. Karwacki