Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4.

Raymond N. Vrtis; Mark L. O’Neill; Jean Louis Vincent; A.S. Lukas; Brian K. Peterson; Mark D. Bitner; Eugene J. Karwacki

doi:10.1557/proc-766-e7.4

Related publications

Article2003

Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition

Mark L. O’Neill, Raymond N. Vrtis, Jean Louis Vincent, A.S. Lukas, Eugene J. Karwacki, Brian K. Peterson, Mark D. Bitner

Chapter in a book2012

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Patrick M. Winter, Gregory M. Lanza, Samuel A. Wickline, Marc Madou, Chunlei Wang, Parag B. Deotare, Marko Lončar, Yoke Khin Yap, Jérôme Rose, Mélanie Auffan, Olivier Proux, Vincent Nivière, Jean‐Yves Bottero, Zhong Lin Wang, Ying Liu, Ronald G. Polcawich, J. S. Pulskamp, R. M. Proie, Woo-Tae Park, Sergei V. Kalinin, Brian J. Rodriguez, Andréi L. Kholkin, Gang Logan Liu, Jao van de Lagemaat, Lorenzo Valdevit, John W. Hutchinson, Seajin Oh, Marc Madou, Katja Tonisch, Enrica De Rosa, Joseph Fernandez‐Moure, Ennio Tasciotti, Denis Gebauer, Brian E. O’Neill, King C. Li

Article1991

Characterization of a:SiC:H thin films deposited by plasma enhanced chemical vapor deposition

Marie‐Paule Delplancke, James M. Powers, Gabor Somorjai

Article1991

Preparation of SixCyHz films from methylsilane by plasma-enhanced chemical vapor deposition

M.P. Delplancke, James M. Powers, G.J. Vandentop, Gabor Somorjai

Article2005

In vitro investigation of hemocompatibility of hydrophilic SiNx:H films fabricated by plasma-enhanced chemical vapor deposition

Guojiang Wan, Ping Yang, Xue Jie Shi, Man Wong, Hongyi Zhou, Nan Huang, Paul Kim Ho Chu