Skip to content
RDL
Network
Ekosistem
Uygulama değiştir
EN
Hakkımızda
SSS
Giriş yap
Başla
Plasma nitridation and microstructure of high-k ZrO2 thin films fabricated by cathodic arc deposition — Anping Huang (2005) | RDL Network
Back
Cite
Save
Save for later
Share
Home
Publications
Plasma nitridation and microstructure of high-k ZrO2 thin films fabricated by cathodic arc deposition
Shared by
Paul Kim Ho Chu
Plasma nitridation and microstructure of high-k ZrO2 thin films fabricated by cathodic arc deposition
Article
2005
en
Authors
+4 more
AH
Anping Huang
RF
Ricky K.Y. Fu
Paul Kim Ho Chu
Discussion
(0)
Sign in
to like and join the discussion.
No comments yet. Be the first to comment.
Related publications
Article
2007
Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation
Anping Huang
,
Zengfeng Di
,
Ricky K.Y. Fu
,
Paul Kim Ho Chu
Article
2006
Bioactivity and cytocompatibility of zirconia (ZrO2) films fabricated by cathodic arc deposition
Xuanyong Liu
,
Anping Huang
,
Chuanxian Ding
,
Paul Kim Ho Chu
Article
2006
Microstructure and visible-photoluminescence of titanium dioxide thin films fabricated by dual cathodic arc and nitrogen plasma deposition
Anping Huang
,
Zengfeng Di
,
Paul Kim Ho Chu
Article
2007
Biomedical Zirconia Films Synthesized by Cathodic Arc Plasma Deposition
Xuanyong Liu
,
Weifeng Li
,
Anping Huang
,
Paul Kim Ho Chu
Article
2001
Cathodic Arc Plasma Deposition of Niobium Nitride Films
T. Zhang
,
Jian Song
,
X. B. Tian
,
Paul Kim Ho Chu
,
I.G. Brown
Discussion(0)
No comments yet. Be the first to comment.