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Plasma distribution in the slender bore excited by coaxial rf electrode — Jingjing Cui (2006) | RDL Network
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Plasma distribution in the slender bore excited by coaxial rf electrode
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Paul Kim Ho Chu
Plasma distribution in the slender bore excited by coaxial rf electrode
Article
2006
en
Authors
+4 more
JC
Jingjing Cui
XT
X.B. Tian
SY
S.Q. Yang
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