Oxygen plasma-assisted magnetron sputtering deposition of non-stoichiometric Y2O3 films: Influence of oxygen vacancies on etching resistance

Yi Wu; Shu Xiao; Yinong Chen; Weixun Dong; Jiancheng Liu; Yong Huang; Kejun Shi; Shuyu Fan; Zishuo Ye; Guoliang Tang; Paul Kim Ho Chu

doi:10.1016/j.surfcoat.2024.131448

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Oxygen plasma-assisted magnetron sputtering deposition of non-stoichiometric Y2O3 films: Influence of oxygen vacancies on etching resistance

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