Novel Design of Carbon-Rich Polymers for 193 nm Microlithography: Adamantane-Containing Cyclopolymers

For 193 nm lithographic applicationsrobust polymers containing a high carbon/hydrogen ratio are required. In this paper a novel cyclopolymerization approach is presented for producing chemically amplified resists that are transparent at the imaging wavelength. Upon exposure to a 193 nm laser stepper, features 160 nm in size can readily be obtained (see Fig.).