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Microstructure and electrical properties of Al2O3–ZrO2 composite films for gate dielectric applications — Ming Zhu (2004) | RDL Network
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Microstructure and electrical properties of Al2O3–ZrO2 composite films for gate dielectric applications
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Paul Kim Ho Chu
Microstructure and electrical properties of Al2O3–ZrO2 composite films for gate dielectric applications
Article
2004
en
Authors
+3 more
MZ
Ming Zhu
PC
Peng Chen
RF
Ricky K.Y. Fu
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