Influence of Reaction with XeF2 on Surface Adhesion of Al and Al2O3 Surfaces

The change of surface adhesion after fluorination of Al and Al{sub 2}O{sub 3} surfaces using XeF{sub 2} was investigated with atomic force microscopy. The chemical interaction between XeF{sub 2} and Al and Al{sub 2}O{sub 3} surfaces was studied by in situ x-ray photoelectron spectroscopy. Fresh Al and Al{sub 2}O{sub 3} surfaces were obtained by etching top silicon layers of Si/Al and Si/Al{sub 2}O{sub 3} with XeF{sub 2}. The surface adhesion and chemical composition were measured as a function of time after the exposure to air or annealing (at 200 C under vauum). The correlation between the adhesion force increase and presence of AlF{sub 3} on the surface was revealed.