Influence of reaction with XeF2 on surface adhesion of Al and Al2O3 surfaces

The change in surface adhesion after fluorination of Al and Al2O3 surfaces using XeF2 was investigated with atomic force microscopy. The chemical interaction between XeF2 and Al and Al2O3 surfaces was studied by in situ x-ray photoelectron spectroscopy. Fresh Al and Al2O3 surfaces were obtained by etching top silicon layers of Si∕Al and Si∕Al2O3 with XeF2. The surface adhesion and chemical composition were measured after the exposure to air or annealing (at 200°C under vacuum). The correlation between the adhesion force increase and presence of AlF3 on the surface was revealed.