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Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages — Xiubo Tian (2001) | RDL Network
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Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages
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Paul Kim Ho Chu
Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages
Article
2001
en
Authors
+1 more
XT
Xiubo Tian
LW
Langping Wang
QZ
Qingyu Zhang
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