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Influence of bias voltage on the tribological properties of titanium nitride films fabricated by dynamic plasma ion implantation/deposition — X.B. Tian (2002) | RDL Network
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Influence of bias voltage on the tribological properties of titanium nitride films fabricated by dynamic plasma ion implantation/deposition
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Paul Kim Ho Chu
Influence of bias voltage on the tribological properties of titanium nitride films fabricated by dynamic plasma ion implantation/deposition
Article
2002
en
Authors
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XT
X.B. Tian
TZ
T Zhang
RF
Ricky K.Y. Fu
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