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Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation — Peter Ha (2005) | RDL Network
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Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation
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Paul Kim Ho Chu
Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation
Article
2005
en
Authors
+3 more
PH
Peter Ha
DM
David R. McKenzie
MB
Marcela Bilek
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