Chemical Vapor Deposition

Patrick M. Winter, Gregory M. Lanza, Samuel A. Wickline, Marc Madou, Chunlei Wang, Parag B. Deotare, Marko Lončar, Yoke Khin Yap, Jérôme Rose, Mélanie Auffan, Olivier Proux, Vincent Nivière, Jean‐Yves Bottero, Zhong Lin Wang, Ying Liu, Ronald G. Polcawich, J. S. Pulskamp, R. M. Proie, Woo-Tae Park,

Authors

Zhong Lin Wang
Beijing Institute of Technology
YL
Yi Liu
ZZ
Ze Zhang

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Publication Info

DOI: 10.1007/0-387-23814-x_5
Year: 2003
Published: —
Language: en

Timeline

Created:June 19, 2026

Sergei V. Kalinin,

Brian J. Rodriguez,

Andréi L. Kholkin,

Gang Logan Liu,

Jao van de Lagemaat,

Lorenzo Valdevit,

John W. Hutchinson,

Seajin Oh,

Marc Madou,

Katja Tonisch,

Enrica De Rosa,

Joseph Fernandez‐Moure,

Ennio Tasciotti,

Denis Gebauer,

Brian E. O’Neill,

King C. Li

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