Vertically Aligned Peptide Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition
Article 2014 en
Authors
MV
Milana Vasudev
HK
Hilmar Koerner
KS
Kristi M. Singh
Abstract
1 min read
In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited d-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.
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