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Chemical Amplification in the Design of Radiation-Sensitive Polymers — Jean Mj Frechet (1989) | RDL Network
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Chemical Amplification in the Design of Radiation-Sensitive Polymers
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Jean Mj Frechet
University of California, Berkeley
Chemical Amplification in the Design of Radiation-Sensitive Polymers
Chapter In A Book
1989
en
Authors
+6 more
Jean Mj Frechet
University of California, Berkeley
FH
Francis M. Houlihan
FB
F. Bouchard
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Related publications
Article
1982
CHEMICAL AMPLIFICATION IN THE DESIGN OF POLYMERS FOR RESIST APPLICATIONS.
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1989
Radiation-sensitive polymers for microelectronics: Design, synthesis, and application
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Resist materials design: Base-catalyzed chemical amplification
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Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
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Base-Sensitive Polymers as Imaging Materials: Radiation-Induced β-Elimination To Yield Poly(4-hydroxystyrene)
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.webp)
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