Triangular Elastomeric Stamps for Optical Applications: Near‐Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Abstract The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross‐sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero‐width features using near‐field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin‐film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface‐enhanced Raman spectroscopic sensing. The applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics‐centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.