Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies

Plasma-based surface treatment techniques such as plasma immersion ion implantation and deposition (PIII&D) is a very useful technique in the fabrication of silicon-on-insulator and high-k dielectrics and is commercially used to produce shallow junctions in deep-submicrometer integrated circuits. The applications of PIII are in fact much broader covering many other areas such as metallurgy and particularly biomedical engineering and optoelectronics. Many of the innovations and protocols developed for PIII&D in semiconductor applications have been translated to the processing of biomedical components. In this invited talk, our recent work pertaining to surface treatment of optoelectronic and biomedical materials is reviewed.