Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self‐Assembly

Nanoscale tip-induced polymerization of a sulfur thin film affords a simple negative tone resist that can be used as mask for substrate etching in fluorinated solutions or as a chemical template for the directed self-assembly of gold nanocrystals. Detailed facts of importance to specialist readers are published as "Supporting Information". Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.