Silicate‐based post‐anodic treatment for lithographic application

Sodium silicate solutions are widely used chemicals for a variety of applications. In particular, they are commonly used in pre‐treatments of aluminium alloys as cleaners and corrosion inhibitors. Another application is found in offset printing, where after graining and anodising, a silicate‐based post‐anodic treatment (PAT) is considered to optimise the aluminium plate characteristics. It is, however, not clear what type of interaction takes place between the oxide‐covered aluminium and the silicate solution. In this work, silicate‐based PAT is studied. Different barrier‐type and porous‐type aluminium oxides are silicate‐treated by dipping in a water‐based sodium silicate solution and the effect of time on the deposition is studied. Particular attention is given to the role of rinsing when the alumina surface is washed in water after the silicate treatment. A good understanding of the role of rinsing allows us to obtain information on the characteristics of the silicate layer which is formed after dipping. The surface modifications induced by the silicate treatment on the aluminium oxides were monitored by means of field emission scanning electron microscopy and infrared spectroscopic ellipsometry. Quantitative measurements on the amount of deposited silicate were taken by X‐ray fluorescence, and relative comparisons between different oxides are shown. Auger electron spectroscopy was used to study the in‐depth composition of the silicate deposition. Experiments show a high affinity of the silicate to the anodic oxide film. A thin nanometric chemisorbed (alumino)silicate layer is present on the surface after rinsing, while the physisorbed part of the layer is washed away. Copyright © 2009 John Wiley & Sons, Ltd.