Pure-Silica Zeolite Low-k Dielectric Thin Films

Dielectric materials with a very low dielectric constant, k, will be required to overcome problems such as cross-talk and propagation delay in future generations of microprocessors, whose features are becoming increasingly smaller. Here pure-silica zeolite is examined as an alternative low-k material. Thin films prepared by in-situ crystallization (see Figure) and a spin-on process are compared.