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Probing Solid Surfaces at the Atomic and Molecular Level under Ambient and Reaction Conditions — Gabor Somorjai (2000) | RDL Network
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Probing Solid Surfaces at the Atomic and Molecular Level under Ambient and Reaction Conditions
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Gabor Somorjai
University of California, Berkeley
Probing Solid Surfaces at the Atomic and Molecular Level under Ambient and Reaction Conditions
Article
2000
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Ambient Pressure X-ray Photoelectron Spectroscopy for Probing Monometallic, Bimetallic and Oxide-Metal Catalysts Under Reactive Atmospheres and Catalytic Reaction Conditions
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Authors
Gabor Somorjai
University of California, Berkeley
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Gabor Somorjai
Article
1991
Chemically etched silicon surfaces viewed at the atomic level by force microscopy
Yun Kim
,
Charles M. Lieber
Journal of the American Chemical Society
Article
2023
Imaging Field‐Driven Melting of a Molecular Solid at the Atomic Scale
Franklin Liou
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Hsin‐Zon Tsai
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Zachary A. H. Goodwin
,
Andrew S. Aikawa
,
Ethan Ha
,
Michael Y. Hu
,
Yiming Yang
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Kenji Watanabe
,
Takashi Taniguchi
,
Alex Zettl
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Johannes Lischner
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Michael F. Crommie
Article
1991
ChemInform Abstract: Chemically Etched Silicon Surfaces Viewed at the Atomic Level by Force Microscopy.
Y. KIM
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Charles M. Lieber
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