Preparation and characterisation of exfoliated graphene for quantum resistance metrology

Gert Rietveld; H. J. van Elferen; A. J. M. Giesbers; A. Veligura; U. Zeitler; Konstantin ‘kostya’ Novoselov; B. J. van Wees; A. K. Geǐm; J.C. Maan

doi:10.1109/cpem.2010.5544190

Abstract

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Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

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