Photo‐embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition‐Fragmentation Chain Transfer Agent

photo-embossed surface relief structures with significantly increased aspect ratios are prepared by addition of a reversible addition fragmentation chain transfer agent. The aspect ratios under inert atmosphere are successfully improved by a factor of almost 10. Moreover, aspect ratios obtained under ambient circumstances, preferred for industrial applications, are also significantly enhanced.