Patterned Polymer Multilayers as Etch Resists

This paper describes the synthesis and characterization of patterned polymer multilayers on self-assembled monolayers (SAMs) and the use of these structures as etch resists for gold. The procedure used to build polymer multilayers consisted of five steps:  (i) A polar thiolHS(CH2)15COOHwas patterned on gold or silver films by microcontact printing (μCP) with a poly(dimethylsiloxane) (PDMS) stamp. (ii) The patterned surface was placed in a solution containing CH3(CH2)15SH to form a nonpolar, methyl-terminated SAM on the remaining bare metal surface. (iii) The regions of the SAM patterned with CO2H groups were activated for further chemical reaction by conversion into interchain anhydride groups. (iv) The activated substrate was allowed to react with poly(ethylene imine) (PEI, branched chain, Mw 750 000). (v) A second polymer layer was attached to the PEI layer by allowing the amine-terminated surface to react with poly(octadecene-alt-maleic anhydride) (POMA, Mw 30 000) or poly(styrene-alt-maleic anhydride)...