Novel Structural Characterisations of Insulating and Electron Beam Sensitive Materials Employing Low Voltage High Resolution Scanning Electron Microscopy — Osamu Terasaki (2013) | RDL Network
Novel Structural Characterisations of Insulating and Electron Beam Sensitive Materials Employing Low Voltage High Resolution Scanning Electron Microscopy
Article 2013 en
Authors
OT
Osamu Terasaki
HC
Haesung Cho
MC
Minhyung Cho
Abstract
1 min read
Following our previous appraisal of high resolution scanning electron microscopy (JEOL News 50 Anniversary Issue) we return to assess the increasing information from nano materials (mesoporous materials, zeotypes, MOF and core-shell materials) delivered to the microscopist through utilisation of scanning electron microscopes employing lenses made from combinations of both electric and magnetic fields. The current limitations are also discussed in detail along with future improvements.
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