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Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon — Yang Ping (2005) | RDL Network
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Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon
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Paul Kim Ho Chu
Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon
Article
2005
en
Authors
+4 more
YP
Yang Ping
GW
Guojiang Wan
XX
Xinxin Xie
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