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Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation — Dezhi Xiao (2020) | RDL Network
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Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation
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Paul Kim Ho Chu
Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation
Article
2020
en
Authors
+3 more
DX
Dezhi Xiao
QR
Qingdong Ruan
LL
Liangliang Liu
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