High-yield, large-scale production of few-layer graphene flakes within seconds: using chlorosulfonic acid and H2O2 as exfoliating agents — Wenbo Lu (2012) | RDL Network
High-yield, large-scale production of few-layer graphene flakes within seconds: using chlorosulfonic acid and H2O2 as exfoliating agents
Article 2012 en
Authors
WL
Wenbo Lu
SL
Sen Liu
XQ
Xiaoyun Qin
Abstract
1 min read
The present communication reports on a rapid exfoliation method for high-yield production of few-layer graphene flakes on a large scale from graphite within seconds with the use of chlorosulfonic acid and H2O2 as exfoliating agents.
Zheling Li, Robert J. Young, Claudia Backes, Wen Zhao, Xun Zhang, A. A. Zhukov, Evan Tillotson, Aidan P. Conlan, Feng Ding, Sarah J. Haigh, Konstantin ‘kostya’ Novoselov, Jonathan N. Coleman
Lei Gong, Robert J. Young, Ian A. Kinloch, Sarah J. Haigh, Jamie H. Warner, J.A. Hinks, Ziwei Xu, Li Li, Feng Ding, Ibtsam Riaz, R. Jalil, Konstantin ‘kostya’ Novoselov
Discussion(0)
No comments yet. Be the first to comment.