The pursuit of defect-suppressed metal halide perovskite films with optimal optoelectronic properties remains a persistent challenge in semiconductor device engineering. In this study, the effects of NH3 plasma on the fabrication of high-quality CsPbBr3 perovskite films are evaluated systematically. NH3 plasma generates NH2 and NH species, which enhance grain growth and reduce defect states. As a result, the trap density decreases significantly from 7.9 × 1012 cm–3 to 6.8 × 1011 cm–3, improving CsPbBr3 film quality. The photodetector assembled with the NH3 plasma-processed CsPbBr3 film delivers outstanding performance, including a responsivity of 62.7 A/W, detectivity of 7.7 × 1012 Jones, ultrafast response time of 0.1/0.3 ms, and exceptional stability, all of which surpass the metrics of the non-plasma-treated device. These findings offer a promising solution for enhancing the quality of CsPbBr3 perovskite films, thereby improving the properties of optoelectronic devices.
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