Fluorocarbon Resist for High‐Speed Scanning Probe Lithography

Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s−1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry. Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2002/2007/z701496_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.