Ferroelectrically Gated Atomically Thin Transition‐Metal Dichalcogenides as Nonvolatile Memory
Article 2016 en
Authors
CK
Changhyun Ko
YL
Yeonbae Lee
YC
Yabin Chen
Abstract
1 min read
Ferroelectrically driven nonvolatile memory is demonstrated by interfacing 2D semiconductors and ferroelectric thin films, exhibiting superior memory performance comparable to existing thin-film ferroelectric field-effect transistors. An optical memory effect is also observed with large modulation of photoluminescence tuned by the ferroelectric gating, potentially finding applications in optoelectronics and valleytronics.
Georgy A. Ermolaev, К. В. Воронин, Denis G. Baranov, Vasyl G. Kravets, Gleb Tselikov, Yury V. Stebunov, Dmitry I. Yakubovsky, Sergey M. Novikov, Andrey A. Vyshnevyy, Arslan Mazitov, Ivan A. Kruglov, Sergey S. Zhukov, Р. И. Романов, Andrey M. Markeev, Aleksey V. Arsenin, Konstantin ‘kostya’ Novoselov, A. N. Grigorenko, Valentyn S. Volkov
Georgy A. Ermolaev, К. В. Воронин, Denis G. Baranov, Vasyl G. Kravets, Gleb Tselikov, Yury V. Stebunov, Dmitry I. Yakubovsky, Sergey M. Novikov, Andrey A. Vyshnevyy, Arslan Mazitov, Ivan A. Kruglov, Sergey S. Zhukov, Р. И. Романов, Andrey M. Markeev, Aleksey V. Arsenin, Konstantin ‘kostya’ Novoselov, A. N. Grigorenko, Valentyn S. Volkov
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