Ferrielectricity controlled widely-tunable magnetoelectric coupling in van der Waals multiferroics
Article 2024 en
Authors
QH
Qifeng Hu
YH
Yuqiang Huang
YW
Yang Wang
Abstract
1 min read
The discovery of various primary ferroic phases in atomically-thin van der Waals crystals have created a new two-dimensional wonderland for exploring and manipulating exotic quantum phases. It may also bring technical breakthroughs in device applications, as evident by prototypical functionalities of giant tunneling magnetoresistance, gate-tunable ferromagnetism and non-volatile ferroelectric memory etc. However, two-dimensional multiferroics with effective magnetoelectric coupling, which ultimately decides the future of multiferroic-based information technology, has not been realized yet. Here, we show that an unconventional magnetoelectric coupling mechanism interlocked with heterogeneous ferrielectric transitions emerges at the two-dimensional limit in van der Waals multiferroic CuCrP<sub>2</sub>S<sub>6</sub> with inherent antiferromagnetism and antiferroelectricity. Distinct from the homogeneous antiferroelectric bulk, thin-layer CuCrP<sub>2</sub>S<sub>6</sub> under external electric field makes layer-dependent heterogeneous ferrielectric transitions, minimizing the depolarization effect introduced by the rearrangements of Cu<sup>+</sup> ions within the ferromagnetic van der Waals cages of CrS<sub>6</sub> and P<sub>2</sub>S<sub>6</sub> octahedrons. The resulting ferrielectric phases are characterized by substantially reduced interlayer magnetic coupling energy of nearly 50% with a moderate electric field of 0.3 V nm<sup>-1</sup>, producing widely-tunable magnetoelectric coupling which can be further engineered by asymmetrical electrode work functions.
Dmitry Lebedev, J. Tyler Gish, Ethan S. Garvey, S. Carin Gavin, Thomas W. Song, Manuel R. Tiscareno, Kenji Watanabe, Takashi Taniguchi, Jan Konečný, Zdeněk Sofer, Nathaniel P. Stern, Vinod K. Sangwan, Mark C. Hersam
Yue Luo, Dapeng Ding, Andrés M. Mier Valdivia, Daniel T. Larson, Song Liu, Hong Kuan Ng, Jing Wu, Kenji Watanabe, Takashi Taniguchi, Efthimios Kaxiras, Hongkun Park, Philip Kim, William L. Wilson
Discussion(0)
No comments yet. Be the first to comment.